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Digital Electronics Competitive Exam: Practice Test 13 (Chapter 21)
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The process used to create the integrated circuits that are present in everyday electrical and electronic devices is called
Two gates of enhancement type NMOS in PROM is made up of
EPROMS are slowly replaced by
To trapped electron, UV light impacts sufficient
Fabrication process which can be done by reduction of the process temperature or by performing short term annealing processes at high temperatures is
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